High Vacuum Two-Target Magnetron Sputtering Coating Machine

• After-sales Service: 1 Years
• Warranty: 1 Years
• Nw: 44
• Shipping Cost: Estimated freight per unit.: about shipping cost and estimated delivery time.
• Currency: US$
• Return&refunds: You can apply for a refund up to 30 days after receipt of the products.
• Model NO.: Q10-153
• Gw: 56
• Term: Fob
• Brand: Jinrong
• Transport Package: Case
• Specification: customied
• Trademark: Jinrong
• Origin: China
• Package Size: 22.00cm * 22.00cm * 12.00cm
• Package Gross Weight: 2314.000kg

Product Description

Model: S350
Features:
1. It can be used to develop nano-level single-layer films, multilayer films, nano-composite films, binary hybrid films, binary alloy films, etc.
2. It can be used to prepare metal film, alloy film, semiconductor film, ceramic film, dielectric film, magnetic film, etc., for example: gold, silver, aluminum, copper, titanium, nickel, zirconium, chromium, nickel-chromium alloy, titanium oxide, ITO , Silica, alumina carbon, etc.
3. It can be used for single-target sputtering, two-target sequential sputtering, two-target co-sputtering, and two-target alternate sputtering.
4. The equipment has long-term stable operation, simple operation and easy to use.
Introduction to the main technical solutions of the equipment:
1. Vacuum chamber: made of high-quality 304 stainless steel material, φ350 mm×H350mm, the chamber is reserved with vacuum detection interface, sputtering cathode interface, and air extraction interface.
Ultimate vacuum: better than 6.0×10-5Pa
2. High vacuum system: high vacuum molecular pump + direct mechanical pump + high vacuum valve
Molecular pump: 1 unit, model FF-160/620 compound molecular pump, pumping speed: 600 L/S: 1 unit,
Mechanical pump: 1 set, model: TRP-24, 6L/S,
Vacuum valve model: CCQ-150 electric flapper valve: 1 pc;
GDQ-J40mm electric flapper valve: 2 pcs;
Electric air release valve: 1 pc;
Pumped from the atmosphere to 6.0×10-3Pa≤15min,
Pressure rise rate: from ultimate vacuum to 10Pa, no less than 12 hours
3. Vacuum detection system:
1 set of compound vacuum gauge, model ZDF-5227BY; 1 ionization gauge, model ZJ-27 (CF35 interface);
Two resistance gauges, model ZJ-52T (KF16 interface);
Film gauge: 0.1 Torr, CDG-025D, Inficon. Monitoring the vacuum use of the coating during the coating process;
4. Gas flow controller: 2 sets;
It can meet the independent and combined control of 2 kinds of reaction gas and working gas
Argon gas: 200sccm
Nitrogen: 200sccm
Specification model: S500,
The accuracy of the flow meter is ±1.5% F.S.
Flowmeter repeatability ±0.2%F.S
Flowmeter linearity ±1%F.S
Solenoid globe valve: 1 set
5. Substrate table: 1 set
Diameter 120mm, speed 0-40 rpm adjustable and controllable, sealed by magnetic fluid, vacuum chamber
Introduced from the bottom, the sputtering target is introduced from the top of the vacuum chamber, sputtering from top to bottom, and the maximum heating temperature of the built-in heater is 400ºC. Can spin coating within 100mm diameter.
6. Coating system:
Equipped with a DC magnetron sputtering plane target, the target size is 2 inches, a set of DC pulse sputtering power supply, the power is 1000W, and the 485 communication function is included.
1 RF magnetron sputtering target, target size: 2 inches, 1 set of RF sputtering power supply, power 500W, automatic matching device included, frequency 13.56MHz.
Independently equipped with electric anti-fouling baffle, with 100 megohm electrical insulation performance and high vacuum sealing performance, electronic discharge through 3500GS, permanent magnet to ensure discharge stability, long-term use performance is stable and reliable;
7. Main water circuit: 2 sets, 1 set of water pressure sensor, used to monitor the water pressure during the coating process; independent cooling water branch for vacuum chamber, molecular pump, and sputtering target, separate ball valve,
8. The equipment adopts PLC+industrial computer+LCD touch screen structure,
Realize fully automatic control, realize manual control of coating equipment in the manual operation interface, with one-key implementation of automatic process coating process (evacuation, heating, cleaning, coating process) real-time online detection of equipment working parameters, voltage, current, air pressure, flow, Water pressure, temperature, speed and other parameters. It has a complete protection interlock function, including water shortage alarm, gas shortage alarm, missing item alarm, water temperature too high alarm, pressure alarm, vacuum pressure abnormal alarm, with three-phase phase sequence protection, water shortage protection, gas shortage protection, valve Interlocking, power supply and vacuum interlocking, and strict mutual control procedures to protect the personal safety of operators.
9. One-piece rack.
10. Provide customers with the structure and principle drawings of the equipment (including mechanical and electrical); provide two seal rings and 2 spare parts for vacuum gas pipe equipment.
11. Other auxiliary accessories:
1 set of supporting 2P chiller
12. The equipment warranty period is one year.
Scope of supply of high vacuum two-target magnetron sputtering coating machine:
1. Vacuum chamber: Ф350×H350mm;
2. Magnetron target: 2 sets of 2 inches;
3. Vertical upper flip structure;
4. Film gauge: 1 set;
5. Film thickness monitor: 1 set;


II Quotation and description of equipment

NO	Name		Model	Qty	Amount (USD)	Remark
1	High vacuum two-target magnetron sputtering coating machine	complete machine	S350	1set	53,340	Implement relevant Chinese standards
2	Total FOB USD53,340 (including the cost of random spare parts) Delivery time is 60 days, and the quotation is valid for 3 days (the material price fluctuates greatly, please understand)